PVD10-Ten Sources Multi-process Evaporation / Sputtering Deposition System

Click to download the datasheet PVD-10 _Br.pdf

Description

The PVD10 is a modular cost efficient system physical vapor deposition system with a D-shaped chamber. It is dedicated to the deposition process of materials. The fully automated solution is ideal for small batch production in an R&D Environment. It also exists in hybrid configuration in association with evaporation techniques. 

The PVD10 is a modular cost efficient system physical vapor deposition system. It is dedicated to the Evaporation or Sputtering deposition process of materials. The fully automated solution is ideal for small batch production in an R&D Environment. 


MAIN SPECIFICATIONS

Stainless steel chamber – 400 mm diameter 
Fast Entry Frontal Door with viewports
Sample holder for substrates of up to 4"
Multi sources configuration
* Thermal sources
* Organic sources
* E-Beam
* Magnetron cathodes
Quartz deposition measurement
Substrate holder with several functions:
* Heating up to 750°C
* Cooling
* Rotation
* Translation
Water cooling to avoid excess heating
Pumping group with turbomolecular or cryogenic pump
Supervision/ Process control : PC software connected to a PLC

Benefits