PVD10 - Ten Sources Multi-process Evaporation Deposition System
Description
The PVD-10 is a modular cost efficient system physical vapor deposition system. It is dedicated to the Evaporation or Sputtering deposition process of materials. The fully automated solution is ideal for small batch production in an R&D Environment.
Core system features:
* D-shape Stainless Steel chamber with sliding door & viewing port
* Up to 10 rotatable substrate holders
* Pneumatic shutters
* Source selection switch
* Custom-made substrate holder of up to 4 inches
* Up to 2 Quartz sensors
Deposition techniques
Thermal/organic evaporation:
* evaporation by joule effect
* up to 10 metallic or organic evaporation sources
* organic 2cc/inorganic
E – beam evaporation:
* electron beam bombardment
* 4x6cc hv source
* multiple rotatable crucibles
Magnetron sputtering:
* RF, DC or DC pulsed source power supplies
* up to 4 sources
Hybrid configuration:
* Combined sputtering & evaporation processes
* Process switching controlled by software