GEOPHYSIC TOOLS EXPLORATION & PRODUCTION PILOTS PLANTS & LABORATORY EQUIPMENT
MECA 2000
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Four Sources Magnetron Sputtering (1"- 2") Deposition System (PVD4-SP)

The PVD4 is a Physical Vapor Deposition system dedicated to the Evaporation or Sputtering deposition process of materials. Its evolutionary design is particularly adapted to laboratory requirements in terms of every day applications, its simplicity to use and its competitive price.

FEATURES

* 1” or 2” magnetron cathode 
* Integrated Pneumatic shutters 
* RF, DC or DC Pulsed source power supplies 
* Up to 3 cathodes in Sputter Down or Sputter Up configuration 
* Mass Flow Controller for Gas Line 
* Pressure regulation by throttle valve

ADVANTAGES

*
Multideposition techniques: Thermal Evaporation / Organic Evaporation / Sputtering
* Fast pumping speed
* Pressure management
* Thickness monitoring
* Scalability
* Design flexibility
* Compact

PVD4