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Ten Sources Multi-process Magnetron Sputtering Deposition System (PVD10)

The PVD10 is a modular cost efficient system physical vapor deposition system. It is dedicated to the Evaporation or Sputtering deposition process of materials. The fully automated solution is ideal for small batch production in an R&D Environment. 


MAIN SPECIFICATIONS

  • Stainless steel chamber – 400 mm diameter 
  • Fast Entry Frontal Door with viewports
  • Sample holder for substrates of up to 4"
  • Multi sources configuration
    * Thermal sources
    * Organic sources
    * E-Beam
    * Magnetron cathodes
  • Quartz deposition measurement
  • Substrate holder with several functions:
    * Heating up to 750°C
    * Cooling
    * Rotation
    * Translation
  • Water cooling to avoid excess heating
  • Pumping group with turbomolecular or cryogenic pump
  • Supervision/ Process control : PC software connected to a PLC


PERFORMANCES

  • Thickness Homogeneity                                                             ± 2%
    (working distance of approx. 100 mm)                                                           
  • Thickness Reading Precision                                                     0.1 A
  • Deposition Rate Reading precision                                         0.01 A
  • Vacuum Base Pressure (deposition chamber)                        10-7 mbar
  • Pumping-down Time (10-6 mbar)                                            < 20 mn