Pulsed Laser Deposition Technique
A pulsed laser beam strikes the surface of the target material causing evaporation on its surface. The short laser pulses induces a rapid temperature increase to thousands of degrees Celsius at the surface of the target whilst the bottom of the target remains close to room temperature. The advantage of this nonequilibrium heating is that a flash of evaporants is produced and deposited on the substrate to form the film, which has a composition quasi-identical to the target.
The PLD produces a highly forward directed and confined plume of materials which can be deposited with relatively low contamination. It is vey precise technique capable of depoisting one cell of material thick (1-2 nm) for superconductor applications.
Main applications include:
* VLSI circuits
* Medical Implants