PVD4-EB Electron Beam Evaporator
Description
The PVD4-EB is a modular cost efficient Physical Vapor Deposition system and dedicated to the E-Beam thermal evaporation of materials. The fully automated PVD4-EB is ideal for R&D Environment. The unit is equipped with a E-gun with 4 x 4cc rotatable crucibles.
Features
* 4x4 cc electron beam source (metals) with 3KW Power supply
* Motorized crcuble and beam controller (GENIUS II)
* Secured tubopumping group (short pumping cycles)
* Vaccuum limit: 10-7 mbar range or better
* Substrate diameter : up to 4 inches
* Rotating and water cooled substrate holder (for Lift-Off)
* Rotating and heating substrate holder
* Dedicated top viewport for accurate beam control
* Accurate control of the deposition rates
* Complete supervision of the system with management of pumping, venting, making of complex recipes...
