PVD20 S: Magnetron Sputtering Deposition System


The PVD20 S system emerges as a pivotal solution within Vinci Technologies' physical vapor deposition arsenal, focusing on magnetron sputtering. This system is adept at meeting the vast demands across industries such as biomedical, automotive, and particularly semiconductor equipment, merging efficiency with the forefront of sputtering technology. Its design is crafted for simplicity and cost-effectiveness, appealing to laboratories seeking consistent, reliable operation. The system's capability to accommodate large substrates and its integration with optional features like load locks and RF plasma pre-cleaning positions it as a multifaceted tool for thin film coating and surface and coatings technology development.


* D-Shaped Steel Vacuum Chamber: A 500 mm diameter chamber, equipped with option for load locks for rapid sample throughput and maintaining high vacuum conditions.

* Versatile Substrate Handling: Supports substrates up to 6 inches, with sputter coating options that include rotation and heating configurations of 350, 650 or 850°C, enhancing film properties for 3D batteries and anti-reflecting layers.

* Advanced Sputtering Capabilities: Features up to 4 x 3” or 4” magnetron cathodes in a Sputter Up configuration, providing a broad range of materials for optical coating and sputter coater applications.

* Optimized Vacuum and Cooling: Integrates a secured turbomolecular or cryo-pumping group, crucial for achieving high vacuum levels

* Comprehensive Control Software: Offers user-friendly software for full process supervision, crucial for physical vapor deposition precision and magnetron sputtering efficiency.


* Broad Application Range: Ideal for a spectrum of research needs, from thin-film deposition for 3D batteries to creating dielectric coatings and metallic contacts.

* Enhanced Deposition Precision: Delivers outstanding thickness homogeneity and deposition rate precision, vital for the production of high-quality thin film coatings.

* Increased Throughput: Enhanced by the optional load lock, this feature drastically reduces preparation and process times, elevating productivity.

* Customizable Configuration: The system’s adaptability allows it to be tailored to specific surface and coatings technology requirements, ensuring unparalleled performance.

The PVD20 S system solidifies Vinci Technologies' role in advancing the physical vapor deposition field, offering a blend of versatility, precision, and reliability essential for pushing the boundaries of material science. It stands as an indispensable tool for laboratories aiming to enhance their thin film technology capabilities.