PVD4 SU: Magnetron Sputtering Deposition System


The PVD4 SU system is at the forefront of Magnetron Sputtering technology, showcasing unparalleled flexibility and efficiency tailored for the advanced needs of small to medium-sized R&D laboratories. This system is an essential tool for developing thin film coatings and optical coatings through sputter coating, including applications in 3D batteries and anti-reflecting surfaces. Capable of accommodating up to 3 x 2'' cathodes, the PVD4 SU excels in various sputtering tasks, providing precision and versatility in magnetron sputtering. notionvc: fdbb44a2-87cf-40fc-a6cd-8ae92920df50


* Versatile Magnetron Sputtering: Supports up to 3 x 2'' cathodes, allowing for a wide array of materials to be deposited, perfect for applications in surface and coatings technology and sputter coating.

* Compact Design: The vacuum chamber, with a 320 mm diameter, ensures ease of use and maintenance, featuring a quick-access frontal door with a viewport, essential for observing sputter coater processes.

* Advanced Cooling System: Optional integrated water cooling prevents overheating of the thin film embedded layers, crucial for maintaining optimal magnetron sputtering performance.

* Sample Holder: Accommodates substrates up to 6'' in diameter, offering flexibility for projects requiring thin film coatings and optical coatings.

* High Vacuum Capability: Achieves a base pressure of 10-7 mbar in the vacuum chamber, ensuring a pristine and high-quality physical vapor deposition environment.


* Precision and Flexibility: The PVD4 SU is designed for a broad spectrum of materials, making it an ideal system for R&D environments aiming to innovate in the fields of thin film coating and anti-reflecting technologies.

* Cost-Effectiveness: Provides a competitive edge with its efficient design and capabilities, offering high-quality magnetron sputtering at an accessible price point.

* Ease of Use and Maintenance: Designed with user-friendliness in mind, it's accessible to operators of all skill levels, supporting the development of surface and coatings technology.

* Comprehensive System Supervision: Allows for complete oversight of the system, including pumping, venting, and the execution of complex recipes, ensuring a smooth and efficient operation for vacuum chamber management. Device securites are managed via program logic interface (PLC), independent of GUI supervision software for optimised system safety.

* Proven Performance: Vinci Technologies' expertise in vacuum technology and physical vapor deposition backs this system, ensuring reliable and efficient deposition processes.

The PVD4 SU system stands as a testament to Vinci Technologies' commitment to advancing material science and engineering through innovative and reliable magnetron sputtering solutions. It is engineered to exceed expectations, providing unparalleled performance and flexibility for research, development, or educational purposes, especially in the creation of thin film coatings, optical coatings, and anti-reflecting surfaces.